TSMC may not adopt ASML's next-generation High NA EUV lithography machine

A TSMC executive said the company does not necessarily need to use ASML's next-generation High NA EUV lithography machine to manufacture the upcoming 2027 A16 chip technology. Although the High NA EUV lithography machine is expected to reduce the chip size by two-thirds, TSMC needs to weigh its cost and reliability. TSMC may design its A16 wafer fab to accommodate this technology, but it has not yet been determined.