Rapidus purchased the first ASML EUV lithography machine to advance 2nm GAA semiconductor process manufacturing

Rapidus announced that its first ASML TWINSCAN NXE:3800E lithography machine has been delivered and installed at the IIM-1 plant. This is Japan's first EUV lithography system for mass production of cutting-edge semiconductors. This lithography machine can meet the manufacturing needs of Rapidus' first-generation mass production process 2nm, and compared with the previous NXE:3600D, the wafer throughput has increased by 37.5%.