ASML announces next-generation Hyper-NA EUV lithography technology blueprint

ASML has announced the technical blueprint for its next-generation Hyper-NA EUV lithography machine, which is currently in the early stages of development. Martin van den Brink, the company's former chief technology officer, said that the Hyper-NA EUV lithography machine needs to improve the light source system and increase production efficiency to 400 to 500 wafers per hour.