Intel's "IDM 2.0" strategy

Intel's "IDM 2.0" strategy aims to reshape Intel's leadership in the global semiconductor industry through technological innovation and process improvement. This strategy includes the introduction of High NA EUV lithography machines, a state-of-the-art chip manufacturing equipment that can significantly improve chip performance and transistor density. Intel plans to put High NA EUV technology into commercial production by 2027 and achieve break-even in its foundry business by 2030.