Japan Central Glass develops new SiC substrate manufacturing technology

Japan Central Glass Co., Ltd. recently announced that it has successfully developed a new silicon carbide (SiC) substrate manufacturing technology. The advantage of this new technology is that it can reduce costs and increase output. Compared with the traditional high-temperature sublimation method, the liquid phase method has obvious advantages in manufacturing large-size and high-quality SiC substrates. It is expected that the application of new technology can reduce the manufacturing cost of substrates by more than 10%, while greatly improving the yield. Japan Central Glass Co., Ltd. has begun discussions with large semiconductor companies in Europe and the United States, etc., with the aim of allowing customers to adopt SiC substrates made with new technology. Central Glass plans to start providing samples to customers as early as the summer of 2024 and to achieve commercialization in 2027-2028.